发明名称 Reverse voltage bias for electro-chemical plating system and method
摘要 A method of immersing a substrate into electrolyte solution for electroplating, the method comprising connecting an electric source between an anode immersed in the electrolyte solution and a seed layer formed on the substrate. A first voltage level of the seed layer is biased to be equal to, or more positive than, a second voltage level of the anode. The substrate is then immersed into the electrolyte solution.
申请公布号 US6551484(B2) 申请公布日期 2003.04.22
申请号 US20010766060 申请日期 2001.01.18
申请人 APPLIED MATERIALS, INC. 发明人 HEY H. PETER W.;DORDI YEZDI N.
分类号 C25D5/00;C25D7/12;H01L21/00;H01L21/288;H05K3/24;(IPC1-7):C25D5/00;C25D17/00;C25B15/00 主分类号 C25D5/00
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