发明名称 H2O SUPPLYING MECHANISM FOR DETOXIFYING DEVICE AND PLASMA DETOXIFYING METHOD
摘要 <p>PROBLEM TO BE SOLVED: To provide a H2 O supplying mechanism for detoxifying device and a plasma detoxifying method which improves a decomposition efficiency of PFC. SOLUTION: Gas GS containing PFC gas which is an object to be detoxified is guided to a detoxifying device, for example, a plasma type detoxifying device. An O2 supplying pipe 12 and a H2 O supplying pipe 13 are connected to a conduit 11 passing the gas GS which is the object to be detoxified in the preceding step of the detoxifying device. The H2 O supplying pipe 13 is communicated with a water cylinder 14 which stores water (H2 O). In the circumference of the H2 O supplying pipe 13, a magnet unit 15 which applies a magnetic field to the H2 O passing the inside of the supplying pipe 13 is arranged. The magnet unit 15 is a magnet and generates low cluster water in which the bonding between water molecules is cut off by applying a magnetic field to H2 O.</p>
申请公布号 JP2003117344(A) 申请公布日期 2003.04.22
申请号 JP20010315864 申请日期 2001.10.12
申请人 SEIKO EPSON CORP 发明人 OBA KENJI
分类号 B01D53/70;B01D53/34;B01J19/08;C02F1/48;(IPC1-7):B01D53/70 主分类号 B01D53/70
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