发明名称 Dummy layer diode structures for ESD protection
摘要 Described are structures for a device with a controllable dummy layer which can provide a low controllable trigger voltage and can be used as a first triggered device in ESD protection networks. A controllable dummy layer diode is provided which is structured as a butting diode with a dummy polysilicon layer above the butting region. The dummy polysilicon layer functions as an STI block to remove the STI between the n+ and p+ regions of the diode. In one embodiment the diode has the function of a controllable gate with a punchthrough-like-trigger, in which a capacitor-couple circuit couples a portion of the ESD voltage into the gate of the diode to provide a gate voltage. By changing the channel length under the gate of the diode as well as the gate voltage, the reverse-biased voltage of the diode is readily adjusted to a predetermined
申请公布号 US6552399(B2) 申请公布日期 2003.04.22
申请号 US20020067558 申请日期 2002.02.07
申请人 CHARTERED SEMICONDUCTOR MANUFACTURING LTD. 发明人 JUN CAI;FOO LO KENG
分类号 H01L21/8234;H01L27/02;(IPC1-7):H01L23/62 主分类号 H01L21/8234
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