| 摘要 |
PURPOSE: To obtain antireflection films for an IR region having an antireflection effect in both bands of a wavelength range of 3 to 5μm and 8 to 12μm by forming first to fifth layers of ZnS, Si or Ge, ZnS, metal oxide and metal fluoride, respectively. CONSTITUTION: A substrate 1 is formed of Ge and the optical films are so formed that the first layer from the substrate 1 is the ZnS, the second layer is the Si or Ge, the third layer is the ZnS, the fourth layer is the metal oxide and the fifth layer is the metal fluoride. Namely, the substrate 1 is formed on a lens and a window made of Ge and the ZnS layer 2, the Si or Ge layer 3, the ZnS layer 2, the metal oxide layer 4 and the metal fluoride layer 5 are disposed successively. The IR region for such IR region antireflection films signifies the range of the wavelength of 3 to 12μm and is handled in some cases dividedly to the two ranges of the wavelength of 3 to 5μm which is the window of the atm. and the wavelength of 3 to 5μm which is the window of the atm. and the wavelength 8 to 12μm. Then, the antireflection films for the IR region having the antireflection effect in both bands of the wavelength range of 3 to 5μm and 8 to 12μm are obtained. |
