发明名称 USE OF PULSED VOLTAGE IN A PLASMA REACTOR
摘要 An apparatus for providing a positive voltage spike to a semiconductor substrate pedestal during a portion of a high voltage power bias oscillation cycle to reduce or eliminate the detrimental effects of feature charging during the operation of a plasma reactor.
申请公布号 KR20030031159(A) 申请公布日期 2003.04.18
申请号 KR20037002281 申请日期 2003.02.17
申请人 发明人
分类号 H01L21/3065;H05H1/46;H01J37/32 主分类号 H01L21/3065
代理机构 代理人
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