发明名称 |
USE OF PULSED VOLTAGE IN A PLASMA REACTOR |
摘要 |
An apparatus for providing a positive voltage spike to a semiconductor substrate pedestal during a portion of a high voltage power bias oscillation cycle to reduce or eliminate the detrimental effects of feature charging during the operation of a plasma reactor.
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申请公布号 |
KR20030031159(A) |
申请公布日期 |
2003.04.18 |
申请号 |
KR20037002281 |
申请日期 |
2003.02.17 |
申请人 |
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发明人 |
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分类号 |
H01L21/3065;H05H1/46;H01J37/32 |
主分类号 |
H01L21/3065 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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