| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure system and a method of exposure for supporting, aligning, and controlling an object so as not to transfer reaction forces and vibrations caused by motion of an object to other elements such as a projection optical system. SOLUTION: This exposure apparatus is provided with a reaction frame 61 that isolates both external vibrations as well as vibrations caused by reaction forces generated from an object stage 30, which is movably supported. Movable followers 72, 82 that are guided on the reaction frame are provide, and cooperating linear force actuators are mounted on the object stage and on the followers to drive and position the object stage. The reaction frame is mounted on a base structure independent of the base 28 of the object stage, so that the object stage is supported in space independent of the reaction frame. Thereby, the object stage base and the object stage are isolated from the reaction forces generated from the actuators, and the transfers of the vibrations to the object stage base and the object stage are minimized. |
