SUBSTRATE TREATMENT APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a substrate treatment apparatus which can improve throughput by solving the problem of throughput not rising in continuous treatment. SOLUTION: A first operation for carrying a substrate mounted on a substrate support member 4 to a cassette 14 storing a treated substrate by a carrying robot 3 and a second operation for carrying a substrate mounted on a cassette 15 storing an untreated substrate to the substrate support member 4 are carried out alternately. Thereby, the substrate mounted on the substrate support member 4 is carried to the cassette 14 storing the treated substrate and the substrate, mounted on the cassette 15 storing the untreated substrate is carried to the substrate support member 4.