POLYMER, RESIST MATERIAL, AND METHOD FOR FORMING PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a resist material which has extremely high resolution and etching resistance at a practical use level and is useful for precision microfabrication, to provide a method for forming a pattern with the resist material, and further to provide a polymer useful as a base resin for the resist material. SOLUTION: This polymer having a weight-average mol.wt. of 1,000 to 500,000 is characterized by containing one or more repeating units selected from repeating units represented by the general formulas (1) to (3) and a repeating unit represented by the general formula (4).