| 摘要 |
PROBLEM TO BE SOLVED: To provide a photoresist remover excellent in property of preventing corrosion of metal wiring of both Al and Cu, excellent also in power to remove a photoresist film and residue after ashing and causing no precipitation of an anticorrosive. SOLUTION: The photoresist remover comprises (a) the salt of hydrofluoric acid and a metal ion-free base, (b) a water-soluble organic solvent, (c) a mercapto-containing anticorrosive and (d) water. When ammonium fluoride is used as the component (a), (e) the salt of hydrofluoric acid and a specified quaternary ammonium hydroxide (such as tetramethylammonium hydroxide or tetrapropylammonium hydroxide) and/or an alkanolamine may further be added. |
