发明名称 PLASMA CONTINUOUS DEPOSITION APPARATUS HAVING MAGNET
摘要 PURPOSE: A plasma continuous deposition apparatus having magnet is provided to improve production efficiency during continuous polymerization by alternately installing north pole magnet and south pole magnet on the backside of electrode so that ionization ratio is improved by an electromagnetic field. CONSTITUTION: The plasma continuous deposition apparatus having magnet comprises a process chamber(101); an upper electrode(102) which is fixed to the upper side of the inner part of the process chamber, and which becomes the cathode; a lower electrode(103) which is installed in the lower side of the upper electrode with the lower electrode being spaced apart from the upper electrode in a certain gap, and which becomes the cathode; an unwinder(105) which is installed at one side of the process chamber, and on which a material to be treated is coiled to supply a sheet type material(104) between the upper and lower electrodes; a winder(106) installed at the other side of the process chamber to wind a material plasma deposited as it is passing through space between the upper and lower electrodes; and north/south pole magnets(121,122) alternately arranged on the backside of the upper and lower electrodes to increase ionization ratio of process gas using a magnetic field generated.
申请公布号 KR20030030768(A) 申请公布日期 2003.04.18
申请号 KR20010063130 申请日期 2001.10.12
申请人 LG ELECTRONICS INC. 发明人 CHO, CHEON SU
分类号 C23C16/54;(IPC1-7):C23C16/54 主分类号 C23C16/54
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