| 摘要 |
PROBLEM TO BE SOLVED: To provide a positive photosensitive composition which improves the profile of lines and suppresses the falling of a pattern. SOLUTION: The positive photosensitive composition comprises (A) a specified acid generator which generates an acid upon irradiation with an active ray or radiation and (B) a resin which has a monocyclic or polycyclic alicyclic hydrocarbon structure and is decomposed by the action of the acid to increase solubility in an alkali developing solution. |
