PATTERN CORRECTING METHOD, AND PATTERN CORRECTING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a pattern correcting method, and a pattern correcting device, capable of performing the optimum correction even through glass, and reducing damage to other function films. SOLUTION: A laser beam from a laser 1 is applied through an objective lens 30 with a corrected PDP glass substrate thickness from the reverse side of a pattern formed surface of a glass substrate 64. Patterns for one picture element are linearly cut by the laser beam passing through the substrate to cut off a discharge electrode. Defects in luminescent spots can thus be corrected without damaging a dielectric layer 63.