发明名称 |
SUBSTRATE TRANSFER SYSTEM |
摘要 |
<p>PROBLEM TO BE SOLVED: To transfer at a high speed a substrate to be processed in a vacuum processing chamber by a vacuum stage system for transferring the substrate to be processed in an evacuated atmosphere. SOLUTION: The substrate transferring system transfers a wafer 20 mounted on a wafer platen 12 in a vacuum chamber 11. It has a first driving mechanism 13A for transferring the wafer platen 12 in the direction of Y1 and a second driving mechanism 14A, which is provided in the vacuum chamber 11 for transferring the wafer platen 12 to and fro and linearly at a high speed in the direction of X1 and X2.</p> |
申请公布号 |
JP2003115527(A) |
申请公布日期 |
2003.04.18 |
申请号 |
JP20010310397 |
申请日期 |
2001.10.05 |
申请人 |
SUMITOMO HEAVY IND LTD |
发明人 |
MORI HIDEHIKO;TOMITA YOSHIYUKI;SAKAKI KAZUTOSHI |
分类号 |
G12B5/00;B65G49/07;F15B15/14;H01L21/027;H01L21/677;H01L21/68;(IPC1-7):H01L21/68 |
主分类号 |
G12B5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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