发明名称 SUBSTRATE TRANSFER SYSTEM
摘要 <p>PROBLEM TO BE SOLVED: To transfer at a high speed a substrate to be processed in a vacuum processing chamber by a vacuum stage system for transferring the substrate to be processed in an evacuated atmosphere. SOLUTION: The substrate transferring system transfers a wafer 20 mounted on a wafer platen 12 in a vacuum chamber 11. It has a first driving mechanism 13A for transferring the wafer platen 12 in the direction of Y1 and a second driving mechanism 14A, which is provided in the vacuum chamber 11 for transferring the wafer platen 12 to and fro and linearly at a high speed in the direction of X1 and X2.</p>
申请公布号 JP2003115527(A) 申请公布日期 2003.04.18
申请号 JP20010310397 申请日期 2001.10.05
申请人 SUMITOMO HEAVY IND LTD 发明人 MORI HIDEHIKO;TOMITA YOSHIYUKI;SAKAKI KAZUTOSHI
分类号 G12B5/00;B65G49/07;F15B15/14;H01L21/027;H01L21/677;H01L21/68;(IPC1-7):H01L21/68 主分类号 G12B5/00
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