发明名称 |
METHOD FOR MAKING THIN LAYERS CONTAINING MICROCOMPONENTS |
摘要 |
The invention concerns a method for making (1) thin layers (5) containing microcomponents (6) using a substrate. Said method comprises in particular, for each layer (5), the following steps: a) local implantation of at least a gaseous species in said substrate (1) perpendicular to a plurality of implantation zones defined on the surface of the substrate (1), avoiding, by adequate selection of the depth and the shape of said implantation zones, degradation of said surface of the substrate (1) during the step b); b) producing microcomponents (6) in the surface layer (5) of the substrate (1) delimited by the implanting depth; and c) separating the substrate (1) in two parts, one part containing the surface layer (5) including said microcomponents (6), and the other the rest of the substrate (1). The invention is useful for producing microcomponents to be integrated on supports different from those used for their manufacture. |
申请公布号 |
WO03032384(A1) |
申请公布日期 |
2003.04.17 |
申请号 |
WO2002FR03422 |
申请日期 |
2002.10.08 |
申请人 |
COMMISSARIAT A L'ENERGIE ATOMIQUE;S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES;ASPAR, BERNARD;LAGAHE, CHRYSTELLE;GHYSELEN, BRUNO |
发明人 |
ASPAR, BERNARD;LAGAHE, CHRYSTELLE;GHYSELEN, BRUNO |
分类号 |
H01L21/265;H01L21/02;H01L21/762;H01L27/12 |
主分类号 |
H01L21/265 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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