Anti-reflection film, and silica layer

摘要

A main object is to provide an anti-reflection film in which the resistance to wet heat of each thin layer constituting a layer stack is better, the optical properties are excellent, a formation rate is high, and the adherability of each thin layer is excellent. The layer stack in an anti-reflection film is formed by depositing a thin layer formed by a plasma CVD method and a thin layer formed by a sputtering method or a evaporation method. In addition, a silica layer as a low refractive index layer is a prescribed silica layer.