发明名称 |
Patterned structure reproduction using nonsticking mold |
摘要 |
Novel nonstick molds and methods of forming and using such molds are provided. The molds are formed of a nonstick material such as those selected from the group consisting of fluoropolymers, fluorinated siloxane polymers, silicones, and mixtures thereof. The nonstick mold is imprinted with a negative image of a master mold, where the master mold is designed to have a topography pattern corresponding to that desired on the surface of a microelectronic substrate. The nonstick mold is then used to transfer the pattern or image to a flowable film on the substrate surface. This film is subsequently cured or hardened, resulting in the desired pattern ready for further processing.
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申请公布号 |
US2003071016(A1) |
申请公布日期 |
2003.04.17 |
申请号 |
US20020267953 |
申请日期 |
2002.10.08 |
申请人 |
SHIH WU-SHENG;LAMB JAMES E.;DAFFRON MARK |
发明人 |
SHIH WU-SHENG;LAMB JAMES E.;DAFFRON MARK |
分类号 |
B29C33/40;B29C33/38;B29C33/42;B29C33/62;B29C59/02;B29K27/12;B81C1/00;G03F7/00;G11B5/855;H01L21/027;(IPC1-7):C03C25/68 |
主分类号 |
B29C33/40 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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