发明名称 Method of producing thermal-developable photosensitive material
摘要 A method of producing a thermal-developable photosensitive material is provided, which prevents mixing of materials between layers to ensure that the coating surface is in a good condition. In this method, liquids for forming a photosensitive layer, an intermediate layer and a protective layer are simultaneously applied in a multilayer form on a substrate to produce a thermal-developable photosensitive material. A pH of the intermediate layer coating liquid is adjusted within a range from 5 to 10 and a viscosity of the intermediate layer coating liquid is adjusted within a range from 20 to 150 mPa.s. Moreover, a pH buffering salt is added to the intermediate layer coating liquid.
申请公布号 US2003073046(A1) 申请公布日期 2003.04.17
申请号 US20020261457 申请日期 2002.10.02
申请人 FUJI PHOTO FILM,CO., LTD. 发明人 IWADO JUNPEI
分类号 G03C1/74;G03C1/498;(IPC1-7):G03C1/498;G03C1/76 主分类号 G03C1/74
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