发明名称 |
Method of producing thermal-developable photosensitive material |
摘要 |
A method of producing a thermal-developable photosensitive material is provided, which prevents mixing of materials between layers to ensure that the coating surface is in a good condition. In this method, liquids for forming a photosensitive layer, an intermediate layer and a protective layer are simultaneously applied in a multilayer form on a substrate to produce a thermal-developable photosensitive material. A pH of the intermediate layer coating liquid is adjusted within a range from 5 to 10 and a viscosity of the intermediate layer coating liquid is adjusted within a range from 20 to 150 mPa.s. Moreover, a pH buffering salt is added to the intermediate layer coating liquid.
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申请公布号 |
US2003073046(A1) |
申请公布日期 |
2003.04.17 |
申请号 |
US20020261457 |
申请日期 |
2002.10.02 |
申请人 |
FUJI PHOTO FILM,CO., LTD. |
发明人 |
IWADO JUNPEI |
分类号 |
G03C1/74;G03C1/498;(IPC1-7):G03C1/498;G03C1/76 |
主分类号 |
G03C1/74 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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