发明名称 |
Electron beam apparatus and electron beam adjusting method |
摘要 |
An electron beam apparatus for irradiating a target with an electron beam includes a reference sample including at least one reference pattern which has a plurality of lattice structures arranged along the circumference of a circle in a evaluation surface of the reference sample; and an adjustment section for adjusting the electron beam by irradiating the evaluation surface with the electron beam on the basis of electrons generated from the reference sample.
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申请公布号 |
US2003071230(A1) |
申请公布日期 |
2003.04.17 |
申请号 |
US20020270068 |
申请日期 |
2002.10.15 |
申请人 |
PIONEER CORPORATION |
发明人 |
WADA YASUMITSU |
分类号 |
G03F7/20;G03F7/207;G11B7/26;H01J37/04;H01J37/153;H01J37/21;H01J37/26;H01L21/027;(IPC1-7):H01J37/147 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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