| 发明名称 |
Deposition method for a passivation layer of a fluid ejection device |
| 摘要 |
In one embodiment of the present invention, a passivation layer of a fluid ejection device is formed by an atomic layer epitaxy process.
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| 申请公布号 |
US2003071877(A1) |
申请公布日期 |
2003.04.17 |
| 申请号 |
US20010978985 |
申请日期 |
2001.10.16 |
| 申请人 |
HESS ULRICH E. |
发明人 |
HESS ULRICH E. |
| 分类号 |
B41J2/14;B41J2/16;(IPC1-7):B41J2/05 |
主分类号 |
B41J2/14 |
| 代理机构 |
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