METHODS FOR THE PRODUCTION OF COMPONENTS AND ULTRA HIGH VACUUM CVD REACTOR

摘要

In order to commercially treat components by CVD, whilst retaining ultra high vacuum residual gas conditions, the components are introduced into a CVD reactor (1), which meets the necessary requirements, in the form of a batch, from a vacuum transport chamber (13) which connects said UHV-CVD reactor (1) with a pre-arranged serial treatment chamber (17). The treatment chamber (17) can be a lock chamber, a further vacuum transport chamber, a coating chamber, a cleaning chamber, an etching chamber, a heating chamber, a buffer chamber or an implantation chamber.