| 发明名称 |
Silicate-containing alkaline compositions for cleaning microelectronic substrates |
| 摘要 |
A method and composition for removing sodium-containing materials such as photoresist from microcircuit substrate material utilizes 1,2-Diaminocyclohexanetetracarboxylic Acid in an organic solvent.
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| 申请公布号 |
US2003071010(A1) |
申请公布日期 |
2003.04.17 |
| 申请号 |
US20020220720 |
申请日期 |
2002.09.04 |
| 申请人 |
SCHWARTZKOPF GEORGE |
发明人 |
SCHWARTZKOPF GEORGE |
| 分类号 |
G03F7/42;H01L21/306;(IPC1-7):C23F1/00;B44C1/22;C03C15/00;C03C25/68 |
主分类号 |
G03F7/42 |
| 代理机构 |
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代理人 |
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| 地址 |
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