发明名称 Method and apparatus for producing a photopolymerizing lithographic plate
摘要 Decrease in sensitivity can be avoided to obtain a stable and highly sensitized photosensitive layer in a process for preparing a photopolymerizing lithographic plate including a coating step and using rubber rollers before and after the coating site. This is achieved by excluding an antioxidant and/or aging retardant from at least the surface of rubber rollers placed before and after the coating site. The photopolymerizing lithographic plate excellent in its sensitivity as compared with the conventional one can be obtained.
申请公布号 US2003070613(A1) 申请公布日期 2003.04.17
申请号 US20020299078 申请日期 2002.11.19
申请人 FUJI PHOTO FILM CO., LTD. 发明人 SASAKI HIDEHITO
分类号 G03F7/004;B41C1/10;B41N1/08;G03F7/00;G03F7/16;(IPC1-7):B05C11/00 主分类号 G03F7/004
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