发明名称 |
RF plasma reactor |
摘要 |
A plasma reactor has a reactor vessel and a pair of electrodes in the form of spaced apart and oppositely disposed metallic surfaces defining therebetween a plasma discharge space. At least one of the metallic surfaces is the surface of a metallic plate having a plurality of gas feed openings extending through the metallic surface towards said discharge space and from a distribution chamber extending along the plate opposite the discharge space. The distribution chamber has a wall opposite and distant from the plate and includes a gas inlet arrangement with a plurality of gas inlet openings distributed along the wall and connected to one or more gas feed lines to the reactor. A gas flow resistant coefficient between the one or more gas feed lines and at least a predominant portion of the connected inlet openings are at least substantially equal.
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申请公布号 |
US2003070761(A1) |
申请公布日期 |
2003.04.17 |
申请号 |
US20020300873 |
申请日期 |
2002.11.21 |
申请人 |
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发明人 |
TURLOT EMMANUEL;CHEVRIER JEAN-BAPTISTE;SCHMITT JACQUES;BARREIRO JEAN |
分类号 |
H05H1/46;B01J19/08;B01J19/24;C03C23/00;C23C16/44;C23C16/455;C23C16/50;C23C16/509;H01J37/32;H01L21/205;H01L21/302;H01L21/3065;(IPC1-7):C23F1/00;B44C1/22;C03C15/00;C23C16/00;H01L21/31 |
主分类号 |
H05H1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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