| 摘要 |
A method and apparatus for selectively exposing a photosensitive workpiece (40) prior to or after lithographically exposing the workpiece (40). The apparatus includes a workpiece pre-aligner (26) for movably supporting and aligning the workpiece (40). A workpiece exposure system (110) is integral with the pre-aligner (26) and includes an optical head (112) in optical communication with the photosensitive workpiece (40) when the workpiece (40) is positioned on the pre-aligner (26). The workpiece exposure system (110) is adapted for providing exposure of the photosensitive workpiece (40). In this manner, select regions of the workpiece can be kept clear of photoresist or can be patterned with indicia (190) such as alphanumeric symbols or bar codes.
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