Transparent barrier film system

摘要

A transparent barrier (3) is applied by plasma assisted gas phase deposition to a plastic substrate (2). A layer (4) of silicon oxide SiOx with a stoichiometric composition of x less than 2 and a thickness of less than 500 nm, preferably less than 20 nm, is applied first, followed by a metal oxide layer (5) of less than 500 nm, preferably 30 to 50 nm thick. An Independent claim is also included for such a barrier layer system where the first layer (4) promotes the adhesion of the second layer (5) which acts as barrier against permeation or diffusion of gases and/or liquids. The second layer is preferably aluminum oxide Al2O3. A protective cover layer of silicon oxide can be applied over the second layer.