发明名称 |
WAFER STAGE FOR EXPOSURE EQUIPMENT |
摘要 |
PURPOSE: A wafer stage for exposure equipment is provided to prevent distortion of a wafer by forming a piezoelectric member at the wafer mounting area of the stage where the wafer is distorted due to the vacuum load. CONSTITUTION: A wafer is mounted on a stage(20) with a plurality of vacuum holes(21) and lift pin holes(22) for leveling. A piezoelectric member(30), being electrically driven, is formed at the wafer edge contact area of the stage(20) where the bending distortion of the wafer is seriously made. The piezoelectric member(30) is vertically expanded by an applied voltage. The piezoelectric member(30) is mainly formed with PZT. The plural piezoelectric members(30) are inserted and fixed within the same radius.
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申请公布号 |
KR20030029665(A) |
申请公布日期 |
2003.04.16 |
申请号 |
KR20010061399 |
申请日期 |
2001.10.05 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KWON, SE UK |
分类号 |
H01L21/027;(IPC1-7):H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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