发明名称 SILICON OXIDE MEMBRANE
摘要 <p>A silicon oxide film is formed on the surfaces of a plastic substrate and contains methyl groups and methylene groups in a portion near the interface to the plastic substrate. The silicon oxide film exhibits not only excellent adhesion to the plastic substrate, softness and flexibility but also exhibits excellent gas shut-off property (gas barrier property), makes it possible to achieve excellent gas-shutoff property with a smaller film thickness than that of the conventional films, and can be mass-produced favorably. <IMAGE></p>
申请公布号 EP1302560(A1) 申请公布日期 2003.04.16
申请号 EP20020769579 申请日期 2002.05.13
申请人 TOYO SEIKAN KAISHA, LTD. 发明人 NAMIKI, TSUNEHISA;IEKI, TOSHIHIDE;KURASHIMA, HIDEO;INAGAKI, HAJIME;KOBAYASHI, AKIRA;YAMADA, KOJI;TANIKAWA, MIWAKO
分类号 C23C16/02;C23C16/04;C23C16/40;(IPC1-7):C23C16/40;C01B33/12;B32B9/00 主分类号 C23C16/02
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