发明名称 |
SILICON OXIDE MEMBRANE |
摘要 |
<p>A silicon oxide film is formed on the surfaces of a plastic substrate and contains methyl groups and methylene groups in a portion near the interface to the plastic substrate. The silicon oxide film exhibits not only excellent adhesion to the plastic substrate, softness and flexibility but also exhibits excellent gas shut-off property (gas barrier property), makes it possible to achieve excellent gas-shutoff property with a smaller film thickness than that of the conventional films, and can be mass-produced favorably. <IMAGE></p> |
申请公布号 |
EP1302560(A1) |
申请公布日期 |
2003.04.16 |
申请号 |
EP20020769579 |
申请日期 |
2002.05.13 |
申请人 |
TOYO SEIKAN KAISHA, LTD. |
发明人 |
NAMIKI, TSUNEHISA;IEKI, TOSHIHIDE;KURASHIMA, HIDEO;INAGAKI, HAJIME;KOBAYASHI, AKIRA;YAMADA, KOJI;TANIKAWA, MIWAKO |
分类号 |
C23C16/02;C23C16/04;C23C16/40;(IPC1-7):C23C16/40;C01B33/12;B32B9/00 |
主分类号 |
C23C16/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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