| 发明名称 |
Method for removal of moisture from gaseous hydrogen chloride |
| 摘要 |
<p>An adsorbent and method for removing water from gaseous HCl. MgCl2 supported on an activated carbon or silica gel substrate activated by heating to a temperature between 150 DEG C (302 DEG F) and 300 DEG C (572 DEG F) under vacuum will remove water at partial pressures of below 0.5 torr. Activation of the MgCl2 supported adsorbent can also be effected by heating the adsorbent between 270 DEG C (518 DEG F) and 400 DEG C (752 DEG F) under nitrogen.</p> |
| 申请公布号 |
EP0914863(B1) |
申请公布日期 |
2003.04.16 |
| 申请号 |
EP19980120605 |
申请日期 |
1998.10.30 |
| 申请人 |
AIR PRODUCTS AND CHEMICALS, INC. |
发明人 |
DONG, CHUN CHRISTINE;HSIUNG, THOMAS;GOLDEN, TIMOTHY CHRISTOPHER |
| 分类号 |
B01D53/26;B01J20/04;B01J20/32;C01B7/07;(IPC1-7):B01J20/04 |
主分类号 |
B01D53/26 |
| 代理机构 |
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