发明名称 |
Gel-free colloidal abrasive and polishing compositions and methods of using them |
摘要 |
<p>Gel-free colloidal abrasive polishing compositions and associated methods for polishing (e.g., chemical mechanical polishing) are described. These abrasive polishing compositions are comprised of a surface-modified colloidal abrasive that has been modified with a boron-containing compound(s), such as boron surface-modified colloidal ceria or silica. These compositions are useful in chemical mechanical planarization (CMP) applications as well as In substrate polishing applications. These abrasive compositions are most often negatively-charged colloids, which remain as stable negatively-charged colloids even in acidic media.</p> |
申请公布号 |
EP1302522(A2) |
申请公布日期 |
2003.04.16 |
申请号 |
EP20020022992 |
申请日期 |
2002.10.15 |
申请人 |
DUPONT AIR PRODUCTS NANOMATERIALS, LLC. |
发明人 |
JERNAKOFF, PETER;SIDDIQUI, JUNAID AHMED |
分类号 |
C09G1/02;B24B37/00;C09K3/14;H01L21/304;H01L21/306;H01L21/321;(IPC1-7):C09K3/14 |
主分类号 |
C09G1/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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