发明名称 APPARATUS FOR WASHING SUBSTRATE AND METHOD FOR CONVEYING SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To stabilize the conveyance of a glass substrate in a manner not in contact with the surface of the substrate irrespectively of the thickness of the substrate. SOLUTION: The apparatus is a sheet-system one provided with a conveyance system that conveys the substrate in the form of a sheet and a liquid removal apparatus 13 that removes the liquid from the washed substrate 11 by an air jet and is provided above and below the conveyance system. A substrate alignment nozzle 14 that holds the substrate 11 with jetted fluid is provided upstream of the apparatus 13. Thus, it is possible to stabilize the conveyance in a manner not in contact with the surface of the substrate irrespectively of the thickness of the substrate 11, because the air from the apparatus 13 does not cause a warpage of the substrate 11 and its floatation from the conveyance system, due to the influence on the substrate 11. Further, the nozzle 14 has the function of adjusting the angle, position, and pressure of jetting, so that, when the thickness of the substrate 11 is varied, the adjustment of the angle, position, and pressure of jetting can cope with the change.
申请公布号 JP2003112134(A) 申请公布日期 2003.04.15
申请号 JP20010306362 申请日期 2001.10.02
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 TAWATARI HIROHITO
分类号 G02F1/13;B05B1/04;B08B3/04;C03C23/00;G02F1/1333;(IPC1-7):B08B3/04;G02F1/133 主分类号 G02F1/13
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