发明名称 Method to produce ultra-low friction carbon films
摘要 A method and article of manufacture of amorphous diamond-like carbon. The method involves providing a substrate in a chamber, providing a mixture of a carbon containing gas and hydrogen gas with the mixture adjusted such that the atomic molar ratio of carbon to hydrogen is less than 0.3, including all carbon atoms and all hydrogen atoms in the mixture. A plasma is formed of the mixture and the amorphous diamond-like carbon film is deposited on the substrate. To achieve optimum bonding an intervening bonding layer, such as Si or SiO2, can be formed from SiH4 with or without oxidation of the layer formed.
申请公布号 US6548173(B2) 申请公布日期 2003.04.15
申请号 US20010808632 申请日期 2001.03.14
申请人 ARGONNE NATIONAL LABORATORY 发明人 ERDEMIR ALI;FENSKE GEORGE R.;ERYILMAZ OSMAN LEVENT;LEE RICHARD H.
分类号 C23C16/02;C23C16/26;(IPC1-7):B32B9/00 主分类号 C23C16/02
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