发明名称 |
Semiconductor device and method of fabricating the same |
摘要 |
A semiconductor device includes a semiconductor substrate, a gate electrode formed over the semiconductor substrate and a first interlevel insulating layer which is formed over the semiconductor substrate and has first and second contact holes defined by the first interlevel insulating layer. The semiconductor device also includes a first wiring pattern formed in the first contact hole and on the first interlevel insulating layer, a protection layer covering the first wiring pattern and a second interlevel insulating layer which is formed over the first interlevel insulating layer and has a third contact hole defined by the second interlevel insulating layer. The semiconductor device further includes the third contact hole being located on the second contact hole and a second wiring pattern formed in the second and third contact holes and on the second interlevel insulating layer.
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申请公布号 |
US6548845(B1) |
申请公布日期 |
2003.04.15 |
申请号 |
US20000662651 |
申请日期 |
2000.09.14 |
申请人 |
OKI ELECTRIC INDUSTRY CO., LTD. |
发明人 |
KOIKE OSAMU |
分类号 |
H01L23/522;H01L21/768;H01L21/8234;H01L21/8242;H01L27/108;(IPC1-7):H01L21/823 |
主分类号 |
H01L23/522 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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