FLÄCHENMUSTER MIT ÜBERLAGERTEN BEUGUNGSGITTERN

摘要

The invention relates to a planar pattern (1) consisting of elements (2 to 5) arranged in a mosaic-like manner of which at least one pattern consists of a background element (4) and an image element (2) with microscopically small relief structures which diffract visible light. The planar elements (3) and part elements (5) contain either the microscopically small relief structures diffracting visible light or consist of reflecting or dispersing surfaces. A first diffraction grating B1 is arranged in the image element (2) and a second diffraction grating B2 is arranged in the background element (4). The first diffraction grating B1 and the second diffraction grating B2 are formed by the superimposition of at least two different microscopically small relief structures F1 and F2 which diffract visible light. The first diffraction grating B1 and the second diffraction grating B2 differ only by a relative phase shift DELTA phi between the relief structure F1 and the relief structure F2. On illumination with polychromatic light the pattern presents a single colour, with differences in brightness in areas having different relative phase shift DELTA phi values.