DEPOSITION APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE

摘要

PURPOSE: A deposition apparatus for manufacturing a semiconductor device is provided to prevent a wafer from being slipped on a susceptor by relocating a through hole for fixing a susceptor and a lift finger. CONSTITUTION: Argon gas is supplied between a susceptor(204) and a heater(210a,210b). The argon gas is exhausted through a space between the susceptor and an insulation ring(208) and an interstice between a screw(214) for fixing the susceptor and the first through hole. A non-reaction gas and residues are exhausted through the outlet(220) in a chamber(202).