发明名称 MONITOR APPARATUS AND METHOD FOR VACUUM DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To provide a length measuring SEM (scanning electron microscope) to measure a line width and a hole diameter of a semiconductor device by carrying a wafer in a material room in a high vacuum, grasp easily a state of the device in the high vacuum by using the SEM and allow the SEM to be adapted to other vacuum device. SOLUTION: It becomes possible to grasp a state of device in a vacuum by plotting a state of driving system in the vacuum, a vacuum valve, a state in vacuum and a state of electronic optical system in a screen. A time measurement and a comparison with reference data become possible by plotting ON/OFF timing of a variety of sensors, Open/Close timing and the state in vacuum in a timing chart, accordingly it becomes possible to perform a precise determination during performance of maintenance and repair of the device.</p>
申请公布号 JP2003108223(A) 申请公布日期 2003.04.11
申请号 JP20010303484 申请日期 2001.09.28
申请人 HITACHI LTD 发明人 FUKUBE HITOSHI;SONOBE KENICHIRO;ARIMA JUNTARO
分类号 H01J37/28;G05B23/02;H01L21/027;H01L21/66;(IPC1-7):G05B23/02 主分类号 H01J37/28
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