发明名称 MEMBER FOR TREATING HYDROGEN OF SILICON WAFER
摘要 PROBLEM TO BE SOLVED: To provide a member for treating hydrogen of a silicon wafer capable of improving the lifetime of the silicon wafer and permitting manufacture at a low cost by preventing impurities from being taken into the silicon wafer at the time of heat treatment in hydrogen. SOLUTION: This is a member for treating hydrogen of a silicon wafer using high-purity synthetic silica glass particles deriving from alkali metal silicate and having the total quantity of metal impurities of 1μg/g or less. The total quantity of metal impurities is desirably 0.5μg/g or less.
申请公布号 JP2003109963(A) 申请公布日期 2003.04.11
申请号 JP20010300439 申请日期 2001.09.28
申请人 WATANABE SHOKO:KK;ASAHI DENKA KOGYO KK 发明人 KUSUHARA MASAKI;WATABE HIROYUKI;UEHARA HIROSHI;SANPEI KEIKO;KURITA ARIYASU;OMI JINICHI;TAKAHASHI MAKIO;MORITA HIROSHI
分类号 C03C3/06;H01L21/22;H01L21/324;(IPC1-7):H01L21/324 主分类号 C03C3/06
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