| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an array substrate that is used for forming the active layer of a TFT having high carrier mobility without imposing restrictions on design in a TFT manufacturing process nor adding any additional process. SOLUTION: A photomask for manufacturing an array substrate is provided with a permeable region 310, and a shielding region 320 capable of shielding an energy beam around the permeable region 310. The permeable region 310 permeates the energy beam capable of transforming an amorphous material into a polycrystalline material, and is surrounded by longitudinal direction lines 330, 335 extending almost in parallel with each other, declined direction lines 340, 345 shorter than and connected to the longitudinal lines respectively and bent at angles larger than 90 deg. mutually in the facing direction, and the same declined direction lines 350, 355 connected at another end of each longitudinal line thereto.</p> |
