发明名称 |
LONGITUDINAL DIFFUSION/CVD DEVICE AND WAFER MOVING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a longitudinal diffusion/CVD device and a wafer moving method capable of equally dividing moving and mounting positions of monitor wafers by a simple operation in a short time. SOLUTION: In the longitudinal diffusion/CVD device and the wafer moving method, an operator sets various kinds of parameters from an operating panel. When the number of the monitor wafers is one, two and three or more, the moving and mounting positions of the monitor wafers are calculated by a mechanical controller 4 so that the monitor wafers are respectively equally moved and mounted. Further, the moving and mounting data of all the wafers is prepared to carry out a moving and mounting operation in accordance with the moving and mounting data. |
申请公布号 |
JP2003110002(A) |
申请公布日期 |
2003.04.11 |
申请号 |
JP20020173829 |
申请日期 |
2002.06.14 |
申请人 |
HITACHI KOKUSAI ELECTRIC INC |
发明人 |
FURUICHI TAKAYUKI;MATSUBUCHI YOSHIYUKI |
分类号 |
H01L21/677;H01L21/205;H01L21/22;H01L21/68;(IPC1-7):H01L21/68 |
主分类号 |
H01L21/677 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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