发明名称 MANUFACTURING METHOD OF SHADOW MASK PLATE AND PROTECTIVE FILM FOR SHADOW MASK PLATE
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method of a shadow mask plate using a protective film that does not have fluctuation of the unwinding force (expansion force) and vibration caused by the slip-stick phenomenon, and hardly has occurrence of severe peeling phenomenon due to increase in adhesion by the passage of time and, therefore is superior in adaptability to automation machine in the production line, and a protective film for the shadow mask plate. SOLUTION: This is a manufacturing method of a shadow mask plate in which the shadow mask plate is manufactured by a front and rear two-stage etching. When the protective film that is used for protection of the non-etched face is unwound from the wound roll at a certain unwinding speed, the fluctuation of the unwinding force of the unwound protection film at any section of 0.2 m is maximum value-minimum value <=2N/50 mm width, and a protective film in which an adhesive layer is formed on one face of the support body made of a polyolefin system resin is provided.
申请公布号 JP2003109501(A) 申请公布日期 2003.04.11
申请号 JP20010298050 申请日期 2001.09.27
申请人 SEKISUI CHEM CO LTD 发明人 MATSUNAGA HIDEMI
分类号 C09J7/02;H01J9/14;(IPC1-7):H01J9/14 主分类号 C09J7/02
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