发明名称 ELECTRONIC BEAM EXPOSURE SYSTEM
摘要 PROBLEM TO BE SOLVED: To implement high-precision deflection control by calculating 8-pole deflection data of an electric beam pattern forming with high precision and adjusting a deflection amplifier for all of the 8 poles with high precision. SOLUTION: Data based on a forming pattern is converted to an 8-pole deflection signal by a circuit 102, and the deflected signal is applied to an 8-pole electrostatic deflection device 120 via digital/analog converting deflection amplifier 105. The 8-pole converting circuit 104 comprises a digital circuit, and gain connections are individually conducted by digital for connecting the 8-pole deflection signal in digital by a gain corrective circuit 202 so as to correct a beam form. After the gain correction, the deflection signal is converted to an analog signal and applied to the electrostatic deflection device 120.
申请公布号 JP2003109886(A) 申请公布日期 2003.04.11
申请号 JP20010301376 申请日期 2001.09.28
申请人 HITACHI LTD 发明人 KAMATA MASATO;ANDO MASAAKI
分类号 G03F7/20;H01J37/147;H01J37/305;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/20
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