ABRASIVE SILICA PARTICLE-DISPERSED FLUID, ITS MANUFACTURING METHOD, AND ABRASIVE MATERIAL

摘要

PROBLEM TO BE SOLVED: To provide an abrasive silica particle-dispersed fluid which is low in Na ion content and contains ions which are specified in a range of content, excluding Na ions. SOLUTION: An abrasive silica particle-dispersed fluid contains silica particles having an average grain diameter of 5 to 300 nm and dispersed into it, the Na ion content of the silica particle-dispersed fluid is 100 ppm or below, and the other ion content ranges from 300 ppm to 2 wt.%. If the Na ion content exceeds 100 ppm, Na is left on a polished substrate when the silica particle- dispersed fluid is used as an abrasive material, so that Na left on the semiconductor substrate causes an insulating failure or a short circuit to a circuit formed on the semiconductor substrate.