发明名称 SEMICONDUCTOR INTEGRATED CIRCUIT AND METHOD OF MANUFACTURING THE SAME
摘要 PURPOSE: To solve the problem that, in a conventional semiconductor circuit comprising a plurality of circuit regions using different power-supply voltages, the area of a semiconductor chip becomes large because the semiconductor circuit is manufactured in accordance with the design rule applied to a circuit region having a highest power-supply voltage. CONSTITUTION: The method of manufacturing the semiconductor integrated circuit which comprises a first circuit region 11 using a first power-supply voltage and a second circuit region 12 using a second power-supply voltage different from the first power-supply voltage is constituted in such a way that a first design rule according to the first power-supply voltage is applied to the region 11 and that a second design rule according to the second power- supply voltage is applied to the region 12.
申请公布号 KR20030029012(A) 申请公布日期 2003.04.11
申请号 KR20020019918 申请日期 2002.04.12
申请人 FUJITSU LIMITED 发明人 MIZUMASA TATSUHIRO
分类号 H01L21/3205;H01L21/768;H01L21/82;H01L21/822;H01L23/52;H01L23/528;H01L27/04;(IPC1-7):H01L21/320 主分类号 H01L21/3205
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