PROJECTION EXPOSURE METHOD AND ITS DEVICE

摘要

PROBLEM TO BE SOLVED: To utilize exposure light emitted from an exposure light source without any waste by easily selecting and controlling illumination light optimum for various resolution improvement method. SOLUTION: A ring band-like secondary light source is molded by modifying an optical path of an excimer laser emitted from the exposure light source, the excimer laser emitted from the ring band-like secondary light source is irradiated on a mask or a reticle forming pattern, and light transmitting the mask or the reticle by irradiation is image-formed on an object to be exposed through an image formation optical system as a pattern image of the mask or reticle.