SUBSTRATE TREATMENT DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a substrate treatment device which is capable of restraining a treatment solution from decreasing in concentration. SOLUTION: A treatment tank cover C1 and an overflow tank cover C2 are provided over the cleaning tank 11 and overflow tank 12 of a batch cleaning device 1, and a nearly hermetically closed space SP1 is provided inside the batch cleaning device 1. Nitrogen gas having a small moisture content is fed into the hermetically closed space SP1 through a gas feed opening SG1 provided to the overflow tank cover C2 so as to prevent a treatment solution SOL1 containing a sulfuric acid or a phosphoric acid from coming into contact with the atmosphere at a liquid level SS1. By this setup, a moisture component contained in the atmosphere can be prevented from being absorbed in the treatment solution SOL1, so that the treatment solution SOL1 is prevented from decreasing in concentration.