发明名称 Semiconducting structure for controling current has channel region with channel conduction region of first conductivity type and higher than basic doping level of channel region
摘要 The arrangement has at least a first semiconductor region (2) of a first conductivity type at least partly containing a current path and a channel region (22) forming part of the first region with a basic doping level and current influenced by at least one depletion zone (23,24). The channel region has a channel conduction region (225) for guiding a current that is of the first conductivity type with higher than the basic doping level. AN Independent claim is also included for the following: a method of manufacturing a semiconducting structure for controling a current.
申请公布号 DE10145765(A1) 申请公布日期 2003.04.10
申请号 DE20011045765 申请日期 2001.09.17
申请人 SICED ELECTRONICS DEVELOPMENT GMBH & CO. KG 发明人 ELPELT, RUDOLF;MITLEHNER, HEINZ;SCHOERNER, REINHOLD
分类号 H01L21/331;H01L21/335;H01L29/24;H01L29/739;H01L29/772;(IPC1-7):H01L29/772 主分类号 H01L21/331
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