发明名称 |
Semiconducting structure for controling current has channel region with channel conduction region of first conductivity type and higher than basic doping level of channel region |
摘要 |
The arrangement has at least a first semiconductor region (2) of a first conductivity type at least partly containing a current path and a channel region (22) forming part of the first region with a basic doping level and current influenced by at least one depletion zone (23,24). The channel region has a channel conduction region (225) for guiding a current that is of the first conductivity type with higher than the basic doping level. AN Independent claim is also included for the following: a method of manufacturing a semiconducting structure for controling a current.
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申请公布号 |
DE10145765(A1) |
申请公布日期 |
2003.04.10 |
申请号 |
DE20011045765 |
申请日期 |
2001.09.17 |
申请人 |
SICED ELECTRONICS DEVELOPMENT GMBH & CO. KG |
发明人 |
ELPELT, RUDOLF;MITLEHNER, HEINZ;SCHOERNER, REINHOLD |
分类号 |
H01L21/331;H01L21/335;H01L29/24;H01L29/739;H01L29/772;(IPC1-7):H01L29/772 |
主分类号 |
H01L21/331 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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