| 摘要 |
A point-diffraction interferometer having a source (1) of electromagnetic radiation, a perforated mask (2) on its entrance end, an optics-testing space (4) into which the optics (9) to be tested may be inserted, elements (5, 6) that create a testing beam and a reference beam using a perforated mask (6) on its exit end, and a component (7, 8) that analyzes an interference pattern (16) created by superimposing its testing beam and reference beam. One-dimensional or two-dimensional arrays (12, 15) of nearly point-like through holes are incorporated into the perforated masks (2, 6) on the interferometer's entrance end and exit end. The interferometer has particular application to testing optical systems employed on photolithographic exposure systems.
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