发明名称 ELECTROPLATING BATH AND PROCESS OF DEPOSITION OF HARD STRUCTURIZED CHROMIUM LAYERS
摘要 FIELD: electrodeposition, deposition of chromium on parts of machines. SUBSTANCE: electroplating bath contains aqueous solution which includes at least one compound producing chromium ions (VI) and carrying (a) chromium ions (VI) in amount corresponding to 100.0-600.0 g/l of chromium anhydride; (b) sulfates-ions in the form of sulfuric acid and/or its soluble salt in molar relation of chromium ions (VI) to sulfates-ions (SO2-4) from 90:1 to 120: 1 and (c) 2-hydroxiethane-sulfonate ions in the amount corresponding to 0.01-0.03 g/l of sodium salt. EFFECT: simplified technology of deposition of hard structurized chromium layers and enhanced uniformity of topography of coat and of roughness factor. 17 cl, 3 dwg
申请公布号 RU2202005(C2) 申请公布日期 2003.04.10
申请号 RU20010102496 申请日期 1999.06.24
申请人 KROMOTEK OBERFLEKHENTEKHNIK GMBKH 发明人 STSAMAJTAT KLAUS
分类号 C25D3/04;B41N7/04;C25D3/10;C25D5/14;C25D5/16;C25D5/18;C25D7/00;C25D7/10;(IPC1-7):C25D3/10 主分类号 C25D3/04
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