发明名称 Novel photoresist material to achieve hardbake resist shape control
摘要 A method for forming at least two layers of electrical coils and their supportive resistive layers for a magnetic write head having an ultra-short yoke so that the second and any additional coil layers are formed on flat resistive surfaces to eliminate problems associated with inter- and intra-layer shorting and with shorting between coil and yoke. The resistive layers are formed with flat surfaces and desired apex angles by using a novel two-step photoresist scheme in which a layer of photoresist is first photoexposed and developed, then photoexposed a second time to cure a surface region that will remain flat during a final low temperature curing process.
申请公布号 US2003067713(A1) 申请公布日期 2003.04.10
申请号 US20010971277 申请日期 2001.10.05
申请人 HEADWAY TECHNOLOGIES, INC. 发明人 ZHENG YI;LIU YI-CHUN
分类号 G11B5/17;G11B5/31;(IPC1-7):G11B5/147 主分类号 G11B5/17
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