发明名称 |
Novel photoresist material to achieve hardbake resist shape control |
摘要 |
A method for forming at least two layers of electrical coils and their supportive resistive layers for a magnetic write head having an ultra-short yoke so that the second and any additional coil layers are formed on flat resistive surfaces to eliminate problems associated with inter- and intra-layer shorting and with shorting between coil and yoke. The resistive layers are formed with flat surfaces and desired apex angles by using a novel two-step photoresist scheme in which a layer of photoresist is first photoexposed and developed, then photoexposed a second time to cure a surface region that will remain flat during a final low temperature curing process.
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申请公布号 |
US2003067713(A1) |
申请公布日期 |
2003.04.10 |
申请号 |
US20010971277 |
申请日期 |
2001.10.05 |
申请人 |
HEADWAY TECHNOLOGIES, INC. |
发明人 |
ZHENG YI;LIU YI-CHUN |
分类号 |
G11B5/17;G11B5/31;(IPC1-7):G11B5/147 |
主分类号 |
G11B5/17 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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