发明名称 Chemical consolidation of photoresists in the UV range
摘要 Structured resists are consolidated, that is post-exposure amplified. The amplifying agent used is a compound which contains at least one bicyclic or polycyclic group. The amplifying agent is attached via a reactive group to a reactive anchor group of a polymer that is used for the resist. The process is particularly suitable for amplifying copolymers of cycloolefins and maleic anhydride.
申请公布号 US2003068585(A1) 申请公布日期 2003.04.10
申请号 US20020186651 申请日期 2002.07.01
申请人 ROTTSTEGGE JORG 发明人 ROTTSTEGGE JORG
分类号 G03F7/038;G03F7/039;G03F7/40;(IPC1-7):G03F7/00 主分类号 G03F7/038
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