发明名称 TECHNOLOGY FOR DEPOSITION OF RUTHENIUM COAT
摘要 FIELD: electrodeposition, manufacture of electric contacts, sealed contacts included. SUBSTANCE: technical result of invention lies in deposition of low-porosity, less stressed ruthenium coats displaying improved commutation properties with thickness under 0.5 mcm and in deposition of ruthenium coats without cracks with thickness over 1.5 mcm by electrolytic method. Technology consists in electrolytic deposition of ruthenium coats from electrolytes produced by solution of bi-nuclear nitride-aqua- chloride complex of ruthenium. Electrolysis is conducted under mode of pulsed current with following parameters: period 1.0 ms; relative pulse duration 10%, time average cathode density of current 0.5-8.0 A/sq.dm. EFFECT: raised quality of ruthenium coats. 2 tbl
申请公布号 RU2202006(C2) 申请公布日期 2003.04.10
申请号 RU20010112235 申请日期 2001.05.04
申请人 OV";OV 发明人 KARABANOV S.M.;BYKOV A.N.;LOKSHTANOVA O.G.;RJABKO S.M.;RODIMOV V.A.;SHISHKINA L.V.
分类号 C25D3/50;C25D5/18;(IPC1-7):C25D3/50 主分类号 C25D3/50
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